Title:
SALT, ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2021020898
Kind Code:
A
Abstract:
To provide a salt capable of producing a resist pattern having good CD uniformity (CDU) and a resist composition containing the salt.SOLUTION: A salt represented by formula (I), an acid generator, and a resist composition containing the same are provided. [In the formula, Q1 and Q2 each represent a fluorine atom or a perfluoroalkyl group; R1 and R2 each represent a hydrogen atom, a fluorine atom or a perfluoroalkyl group; z represents an integer of 0-6; X1 represents *-CO-O-, *-O-CO-, *-O-CO-O- or *-O-; L1 represents a single bond or an optionally substituted hydrocarbon group; A1 represents an optionally substituted alicyclic hydrocarbon group; X2 represents *-CO-O-, *-O-CO- or *-O-CO-O-; R3 represents an optionally substituted lactone ring; and Z+ represents an organic cation.]SELECTED DRAWING: None
Inventors:
ADACHI YUKAKO
YAMAGUCHI NORIFUMI
ICHIKAWA KOJI
YAMAGUCHI NORIFUMI
ICHIKAWA KOJI
Application Number:
JP2020126708A
Publication Date:
February 18, 2021
Filing Date:
July 27, 2020
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07C309/17; C07C309/12; C07C381/12; G03F7/004; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation