Title:
SALT, ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2021070692
Kind Code:
A
Abstract:
To provide a salt capable of producing a resist pattern having good CD uniformity (CDU), an acid generator, and a resist composition containing the acid generator.SOLUTION: A salt represented by a formula (I), an acid generator, and a resist composition are provided. [In the formula, Q1 and Q2 each independently represent a fluorine atom or a perfluoroalkyl group; R1 and R2 each independently represent a hydrogen atom, a fluorine atom or a perfluoroalkyl group; z represents an integer of 0-6; X1 represents *-CO-O-, *-O-CO-, *-O-CO-O- or *-O-; L1 represents a single bond or an optionally substituted hydrocarbon group; R3 represents a hydrogen atom or a hydrocarbon group; L2 represents a single bond or an alkanediyl group; L3 represents an alkanediyl group; Ar represents an optionally substituted divalent aromatic hydrocarbon group; and Z+ represents an organic cation.]SELECTED DRAWING: None
Inventors:
NAKAMURA HIROMU
ICHIKAWA KOJI
ICHIKAWA KOJI
Application Number:
JP2020179214A
Publication Date:
May 06, 2021
Filing Date:
October 26, 2020
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07C381/12; C07C309/12; C07C309/17; C07D307/00; C08F8/00; C08F212/14; C08F220/18; C09K3/00; G03F7/004; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation