Title:
SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2021193076
Kind Code:
A
Abstract:
To provide a salt capable of producing a resist pattern having a good mask error factor (MEF), an acid generator and a resist composition containing the acid generator.SOLUTION: There are provided a salt represented by the formula (I), an acid generator and a resist composition. [R1 and R2 each represent -O-L1-CO-O-R10 or the like; L1 represents an alkanediyl group; R4, R5, R7 and R8 each represent a halogen atom, an alkyl fluoride group or the like; R10 represents a group represented by the formula (IC); RA represents a saturated hydrocarbon group; u1 represents an integer of 0 to 2; s1 represents 1 or 2, t1 represents 0 or 1, provided that s1+t1=1 or 2; L2 represents a hydrocarbon group which may have a substituent; X1 and X2 each represent S or O; m1 represents an integer of 1 to 5, m2 and m8 each represent an integer of 0 to 5, m4, m5 and m7 each represent an integer of 0 to 4, provided that 1≤m1+m7≤5 and 0≤m2+m8≤5; AI- represents an organic anion.]SELECTED DRAWING: None
Inventors:
KOMURO KATSUHIRO
OGUMA JUN
ICHIKAWA KOJI
OGUMA JUN
ICHIKAWA KOJI
Application Number:
JP2021086206A
Publication Date:
December 23, 2021
Filing Date:
May 21, 2021
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07D305/06; C07C309/17; C07D307/00; C07D321/10; C08F20/12; C09K3/00; G03F7/004; G03F7/038; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation