Title:
SALT, ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2022191201
Kind Code:
A
Abstract:
To provide a salt which allows a resist pattern having good CD uniformity (CDU) to be produced, and a resist composition containing the same.SOLUTION: There are provided a triphenyl sulfonium salt having a specific substituent, an acid generator, and a resist composition. A phenyl group of the triphenyl sulfonium salt has a substituent containing a benzene skeleton substituted with -O-CO-R10, -O-L10-CO-O-R10 or the like. L10 represents an alkanediyl group, and R10 represents an acid-stable hydrocarbon group.SELECTED DRAWING: None
Inventors:
KOMURO KATSUHIRO
USAGAWA DAN
ICHIKAWA KOJI
USAGAWA DAN
ICHIKAWA KOJI
Application Number:
JP2022096047A
Publication Date:
December 27, 2022
Filing Date:
June 14, 2022
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
G03F7/004; C07C381/12; C07D307/93; C07D321/10; C09K3/00; G03F7/038; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation