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Title:
SALT, ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2023008953
Kind Code:
A
Abstract:
To provide a salt which allows a resist pattern having good CD uniformity to be produced, and a resist composition containing the same.SOLUTION: Specifically, there are provided a salt represented by, e.g., formula (I-1), an acid generator, and a resist composition.SELECTED DRAWING: None

Inventors:
KOMURO KATSUHIRO
TAKAHASHI YUKI
ICHIKAWA KOJI
Application Number:
JP2022106020A
Publication Date:
January 19, 2023
Filing Date:
June 30, 2022
Export Citation:
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Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07D321/06; C07C309/12; C07C381/12; C07D307/00; C09K3/00; G03F7/004; G03F7/038; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation



 
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