Title:
SALT, ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2023021085
Kind Code:
A
Abstract:
To provide a salt which allows a resist pattern having good line edge roughness to be produced, an acid generator, and a resist composition containing the same.SOLUTION: There are provided a salt represented by formula (I), an acid generator, and a resist composition. [In the formula, X1 represents *-CO-O-, *-O-CO- or the like; RA represents a saturated hydrocarbon group; u1 represents an integer of 0-2; s1 represents 1 or 2 and t1 represents 0 or 1, provided that s1+t1=1 or 2; L12 represents a single bond or an optionally substituted hydrocarbon group, provided that -CH2- contained in the group may be substituted with -O-, -S-, -CO- or -SO2-; m1 represents an integer of 1-5; R2 represents a halogen atom, a haloalkyl group or the like; m2 represents an integer of 0-4; and Z+ represents an organic cation.]SELECTED DRAWING: None
Inventors:
ADACHI YUKAKO
NISHITANI NOBUHIKO
ICHIKAWA KOJI
NISHITANI NOBUHIKO
ICHIKAWA KOJI
Application Number:
JP2022121446A
Publication Date:
February 09, 2023
Filing Date:
July 29, 2022
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07D305/06; C07C381/12; G03F7/004; G03F7/038; G03F7/039
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation
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