Title:
SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2023035961
Kind Code:
A
Abstract:
To provide a salt that can produce a resist pattern having excellent CD uniformity (CDU) and a resist composition comprising the same.SOLUTION: The present invention provides a salt represented by formula (I), an acid generator and a resist composition comprising the same [where R4 to R9 each represent a halogen atom, a haloalkyl group or the like. A1, A2 and A3 each represent a hydrocarbon group, the group optionally having a substituent, -CH2- included in the group optionally substituted with -O-, -CO-, -S- or the like. X4, X5 and X6 each represent -O- or -S-. AI- is an organic anion].SELECTED DRAWING: None
Inventors:
KOMURO KATSUHIRO
KATO SAKI
ICHIKAWA KOJI
KATO SAKI
ICHIKAWA KOJI
Application Number:
JP2022135115A
Publication Date:
March 13, 2023
Filing Date:
August 26, 2022
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
G03F7/004; C07D307/00; C07D321/02; C07D409/12; C08F20/10; C09K3/00; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Patent Attorney Corporation Shinju Global IP