Title:
SALT, ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2023117396
Kind Code:
A
Abstract:
To provide a salt, an acid generator, and a resist composition which allow a resist pattern having a good pattern collapse margin to be produced.SOLUTION: There are provided: a salt represented by formula (I); an acid generator containing the salt; and a resist composition. [In the formula, X1 represents -CO-O-, -O-CO- or the like; L1 represents a single bond or a substituted/unsubstituted hydrocarbon group; Ar represents a substituted/unsubstituted aromatic hydrocarbon group; R1 represents -O-CO-O-R10, -O-L10-CO-O-R10 or the like; L10 represents an alkanediyl group; R10 represents a group represented by formula (IC); R2 represents a halogen atom, a haloalkyl group or the like; Z+ represents an organic cation; RA represents a saturated hydrocarbon group; u1 represents 0, 1 or 2; s1 represents 1 or 2 and t1 represents 0 or 1, where s1+t1=1 or 2; and L2 represents a single bond or an optionally substituted hydrocarbon group.]SELECTED DRAWING: None
Inventors:
KOMURO KATSUHIRO
HOMMA HARUKA
ICHIKAWA KOJI
HOMMA HARUKA
ICHIKAWA KOJI
Application Number:
JP2023017568A
Publication Date:
August 23, 2023
Filing Date:
February 08, 2023
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
G03F7/004; C07C381/12; C07D305/06; C08F220/10; G03F7/038; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Patent Attorney Corporation Shinju Global IP