Title:
SALT, ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2023184477
Kind Code:
A
Abstract:
To provide a salt, a resist composition, and the like which allow a resist pattern having good CD uniformity to be produced.SOLUTION: There are provided a salt represented by formula (I), an acid generator, and a resist composition. [In the formula, Ar1, Ar2 and Ar3 each independently represent naphthalene, anthracene or phenanthrene; and A1, A2 and A3 each represent a hydrocarbon group, provided that the group may have a substituent, and -CH2- in the group may be substituted with -O-, -CO-, -S- or the like.]SELECTED DRAWING: None
Inventors:
NAKAMURA HIROMU
DOI DAIGO
ICHIKAWA KOJI
DOI DAIGO
ICHIKAWA KOJI
Application Number:
JP2023097299A
Publication Date:
December 28, 2023
Filing Date:
June 13, 2023
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
G03F7/004; C07C309/58; C07D303/16; C07D305/06; C09K3/00; G03F7/038; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Patent Attorney Corporation Shinju Global IP