SALT, ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN

Japanese Patent JP2023184479

A

To provide a salt, a resist composition, and the like which allow a resist pattern having a good focus margin to be produced.SOLUTION: There are provided a salt represented by formula (I), an acid generator, and a resist composition. [In the formula, Ar1 and Ar2 each represent naphthalene or the like; R1 and R2 each represent -O-R10, -O-CO-R10 or the like; R10 represents a group represented by formula (IC); R4, R5, R7 and R8 each represent a halogen atom, a haloalkyl group or the like; A1 and A2 each represent a hydrocarbon group; RA represents a saturated hydrocarbon group; u1 represents an integer of 0-2; s1 represents 1 or 2 and t1 represents 0 or 1, provided that s1+t1=1 or 2; L12 represents a single bond or an optionally substituted hydrocarbon group; and AI- represents an organic anion.]SELECTED DRAWING: None

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NAKAMURA HIROMU
DOI DAIGO
ICHIKAWA KOJI

JP2023097301A

December 28, 2023

June 13, 2023

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SUMITOMO CHEMICAL CO

G03F7/004; C07C309/57; C07D303/16; C07D305/06; C09K3/00; G03F7/038; G03F7/039; G03F7/20

Patent Attorney Corporation Shinju Global IP

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