Title:
塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法
Document Type and Number:
Japanese Patent JP7138065
Kind Code:
B2
Abstract:
To provide a salt and a resist composition capable of producing a resist pattern with an excellent focus margin (DOF).SOLUTION: There are provided a salt represented by formula (I), an acid generator, and a resist composition containing the same. [In the formula (I), Qand Qeach independently represent a fluorine atom or the like; Rand Reach independently represent a hydrogen atom or the like; z represents an integer of 0-6; Xrepresents *-CO-O- or the like; * represents a binding site to C(R)(R) or C(Q)(Q); Lrepresents a C3-12 alkanediyl group; Rrepresents a C1-12 saturated hydrocarbon group; u1 represents an integer of 0-2; s1 represents 1 or 2 and t1 represents 0 or 1, provided that the sum of s1 and t1 is 1 or 2; and Zrepresents an organic cation.]SELECTED DRAWING: None
Inventors:
Tatsuro Masuyama
Yuichi Mukai
Koji Ichikawa
Yuichi Mukai
Koji Ichikawa
Application Number:
JP2019041880A
Publication Date:
September 15, 2022
Filing Date:
March 07, 2019
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
C07D303/16; C07C381/12; C07D305/06; C09K3/00; G03F7/004; G03F7/039; G03F7/20
Domestic Patent References:
| JP2012193170A | ||||
| JP2014215548A | ||||
| JP2016204370A | ||||
| JP2014058664A | ||||
| JP2013147485A | ||||
| JP2011246439A |
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation