塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法

Title:

塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法

Document Type and Number:

Japanese Patent JP7155800

Kind Code:

B2

Abstract:

The present invention relates to a salt and an acid generator comprising the same, a photoresist composition, and a process for producing a photoresist pattern. The salt comprising a group represented by the formula (aa): In formula (aa), the definition of each substituents is the same as the detail description of the specification.

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Inventors:

Tatsuro Masuyama
Natsuki Okada
Koji Ichikawa

Application Number:

JP2018176974A

Publication Date:

October 19, 2022

Filing Date:

September 21, 2018

Export Citation:

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Assignee:

Sumitomo Chemical Co., Ltd.

International Classes:

C07D493/10; C07D495/10; C09K3/00; G03F7/004; G03F7/038; G03F7/039; G03F7/20

Domestic Patent References:

JP2011037837A
JP2013256496A
JP2011201866A
JP2017155038A

Foreign References:

US20170247323

Attorney, Agent or Firm:

Toru Nakayama
Toru Sakamoto

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