Title:
塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法
Document Type and Number:
Japanese Patent JP7233948
Kind Code:
B2
Abstract:
To provide a salt and a resist composition capable of producing a resist pattern with good CD uniformity (CDU).SOLUTION: The salt has a group represented by formula (I), and the resist composition contains the salt. [In the formula, Rrepresents an optionally substituted aromatic hydrocarbon group; Xrepresents a sulfur atom or an iodine atom; Xrepresents an optionally substituted aliphatic hydrocarbon group, provided that at least one of hydrogen atoms contained in the aliphatic hydrocarbon group is substituted with a group represented by formula (IA); when Xis a sulfur atom, n represents 1-3 and m represents 0-2; when Xis an iodine atom, n represents 1 or 2 and m represents 0 or 1; Arepresents an organic anion; Lrepresents an optionally substituted hydrocarbon group; Rrepresents a saturated hydrocarbon group; u1 represents an integer of 0-2; s1 represents 1 or 2; t1 represents 0 or 1, provided that the sum of s1 and t1 is 1 or 2; and * represents a bond.]SELECTED DRAWING: None
Inventors:
Katsuhiro Komuro
Araki incense
Koji Ichikawa
Araki incense
Koji Ichikawa
Application Number:
JP2019023872A
Publication Date:
March 07, 2023
Filing Date:
February 13, 2019
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
C07D305/06; C07C309/17; C09K3/00; G03F7/004; G03F7/038; G03F7/039; G03F7/20
Domestic Patent References:
| JP2012236816A | ||||
| JP2007178848A | ||||
| JP2012224611A | ||||
| JP2011246439A | ||||
| JP2017095444A |
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation