塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法

Title:

塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法

Document Type and Number:

Japanese Patent JP7288814

Kind Code:

B2

Abstract:

To provide a salt capable of producing a resist pattern having good CD uniformity.SOLUTION: The salt is represented by formula (I) [where Qand Qeach independently represent a fluorine atom or the like; Rand Reach independently represent a hydrogen atom or the like; z represents an integer of 0-6; Xrepresents *-CO-O- or the like; L, Land Leach independently represent a single bond, a C1-12 alkanediyl group or the like; Arepresents a divalent norbornane lactone ring represented above or the like; Rand Reach independently represent a hydrogen atom or the like; Rrepresents an optionally substituted C3-18 cyclic hydrocarbon group or the like; and Zrepresents an organic cation].SELECTED DRAWING: None

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Inventors:

Yukako Adachi
Kunifumi Yamaguchi
Koji Ichikawa

Application Number:

JP2019113566A

Publication Date:

June 08, 2023

Filing Date:

June 19, 2019

Export Citation:

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Assignee:

Sumitomo Chemical Co., Ltd.

International Classes:

C07D313/02; C07C381/12; C07D307/00; C08F220/12; C09K3/00; G03F7/004; G03F7/039; G03F7/20

Domestic Patent References:

JP2011046694A
JP2012226330A
JP2016047815A
JP2017040914A
JP2018062509A
JP2013082665A

Attorney, Agent or Firm:

Patent Attorney Corporation Shinju Global IP

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