Title:
塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法
Document Type and Number:
Japanese Patent JP7296808
Kind Code:
B2
Abstract:
To provide a salt for an acid generator used for fine processing of a semiconductor, an acid generator containing the salt, a resist composition and a method for producing a resist pattern.SOLUTION: The present invention provides a salt represented by formula (I), an acid generator, and a resist composition containing the same. (Q, Q: F, C1-6 perfluoroalkyl. R, R: H, F, C1-6 perfluoroalkyl. z: 0-6. X: -CO-O-,-O-CO-,-O-CO-O-,-O-. L: single bond or C1-6 alkanediyl. t1: 1, 2. t2: 0, 1. t1+t2: 1, 2. R: C1-12 alkyl. R: C1-16 hydrocarbon. u1: 0-8. m: 0-3).SELECTED DRAWING: None
Inventors:
Tatsuro Masuyama
Koji Ichikawa
Koji Ichikawa
Application Number:
JP2019132935A
Publication Date:
June 23, 2023
Filing Date:
July 18, 2019
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
C07D327/06; C07D303/16; C07D305/06; C09K3/00; G03F7/004; G03F7/038; G03F7/039; G03F7/20
Domestic Patent References:
| JP2013041252A | ||||
| JP2011246439A | ||||
| JP2013257537A | ||||
| JP2014166983A | ||||
| JP2012224611A | ||||
| JP2017057192A | ||||
| JP2017207737A |
Attorney, Agent or Firm:
Patent Attorney Corporation Shinju Global IP
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