Title:
SALT, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2012006908
Kind Code:
A
Abstract:
To form a pattern having more excellent resolution and focus margin (DOF).
This salt is represented by formula (I). [In the formula, Q1 and Q2 mutually independently represent a fluorine atom or a 1-6C perfluoroalkyl group; L1 represents *-CO-O-La- or *-CH2-O-Lb-, * represents a bond with -C(Q1)(Q2)-, La and Lb mutually independently represent a bivalent 1-15C saturated hydrocarbon group, and -CH2- contained in the bivalent saturated hydrocarbon group may be substituted by -O-, or -CO-; W1 represents 2-36C heterocyclic ring, and -CH2- contained in the heterocyclic ring may be substituted by -O-; and Z1+ represents an organic counter ion].
Inventors:
YAMAGUCHI NORIFUMI
ICHIKAWA KOJI
ICHIKAWA KOJI
Application Number:
JP2011001782A
Publication Date:
January 12, 2012
Filing Date:
January 07, 2011
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07D295/08; C07C25/00; C07C381/12; C07D295/14; C09K3/00; G03F7/004; G03F7/039; H01L21/027
Domestic Patent References:
JP2009209128A | 2009-09-17 | |||
JP2002214774A | 2002-07-31 |
Foreign References:
WO2009057769A1 | 2009-05-07 |
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation
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