Title:
SALT, QUENCHER, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2020200310
Kind Code:
A
Abstract:
To provide a salt that makes it possible to produce a resist pattern with excellent pattern collapse resistance (PCM), a quencher and a resist composition.SOLUTION: The present invention provides a salt represented by formula (I), and a quencher and a resist composition containing the same [where X1 is -CO-, -SO- or- SO2-].SELECTED DRAWING: None
More Like This:
Inventors:
KOMURO KATSUHIRO
TAKAHASHI YUKI
ICHIKAWA KOJI
TAKAHASHI YUKI
ICHIKAWA KOJI
Application Number:
JP2020094319A
Publication Date:
December 17, 2020
Filing Date:
May 29, 2020
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07D335/16; C07C381/12; C07D339/08; C08F212/14; C08F220/12; C09K3/00; G03F7/004; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation