Title:
SALT, RESIST COMPOSITION, AND METHOD FOR MANUFACTURING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2013126968
Kind Code:
A
Abstract:
To provide a resist composition satisfying the shape of a resist pattern.
A salt is represented by formula (I), wherein Q1 and Q2 are each independently a fluorine atom or a perfluoroalkyl group; L1 and L2 are each independently a divalent saturated hydrocarbon group or the like; the ring W1 is an aromatic ring; the ring W2 is a sultone ring; R1 is a hydroxy group or an alkyl group; R2 is an alklyl group, an alkoxy group or an alkoxycarbonyl group; s and t are an integer of 0 to 2; and Z+ is an organic counter ion.
Inventors:
ICHIKAWA KOJI
OCHIAI MITSUYOSHI
YAMASHITA HIROKO
OCHIAI MITSUYOSHI
YAMASHITA HIROKO
Application Number:
JP2012229815A
Publication Date:
June 27, 2013
Filing Date:
October 17, 2012
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07D327/04; C07C381/12; C09K3/00; G03F7/004; G03F7/039; H01L21/027
Domestic Patent References:
| JP2010106236A | 2010-05-13 | |||
| JP2011081044A | 2011-04-21 |
Foreign References:
| WO2011018467A1 | 2011-02-17 | |||
| WO2011018467A1 | 2011-02-17 |
Attorney, Agent or Firm:
Fukami patent office
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