Title:
SALT, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2012232972
Kind Code:
A
Abstract:
To solve such a problem that the obtained mask error factor of a resist pattern is not always sufficiently satisfactory in a resist composition containing a salt conventionally known as an acid generator.
The present invention relates to a salt represented by formula (I), wherein Q1 and Q2 each independently represent a fluorine atom or a 1-6C perfluoroalkyl group, n represents 0 or 1, L1 represents a single bond or a 1-10C alkanediyl group, a methylene group constituting the alkanediyl group may be replaced by an oxygen atom or a carbonyl group, L1 is not a single bond when n is 0, and Z+ represents an organic cation.
Inventors:
ICHIKAWA KOJI
ADACHI YUKAKO
FUJITA SHINGO
ADACHI YUKAKO
FUJITA SHINGO
Application Number:
JP2012076375A
Publication Date:
November 29, 2012
Filing Date:
March 29, 2012
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07C309/17; C07C25/02; C07C381/12; C07D327/06; C07D333/46; C09K3/00; G03F7/004; G03F7/039; H01L21/027
Domestic Patent References:
| JP2009046479A | 2009-03-05 | |||
| JP2010204646A | 2010-09-16 |
Foreign References:
| US20110065047A1 | 2011-03-17 | |||
| US20110065040A1 | 2011-03-17 | |||
| US20110065041A1 | 2011-03-17 |
Attorney, Agent or Firm:
Toru Nakayama
Toru Sakamoto
Toru Sakamoto
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