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Title:
SALT, RESIST COMPOSITION, AND METHOD OF PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2015107956
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a salt which allows a resist pattern to be produced with a good mask error factor (MEF), and a resist composition containing the salt.SOLUTION: The salt is represented by formula (I) [where Rand Reach independently represent a hydrogen atom, a hydroxy group, or a C1-C12 hydrocarbon group, provided that -CH- contained in the hydrocarbon group may be substituted with -O- or -CO-; m and n each independently represent 1 or 2; two R's are the same or different from each other when m is 2; two R's are the same or different from each other when n is 2; Ar represents an optionally substituted C6-C36 aromatic hydrocarbon group or an optionally substituted C6-C36 heteroaromatic hydrocarbon group; and Arepresents an organic anion].

Inventors:
ADACHI YUKAKO
ICHIKAWA KOJI
YASUE TAKAHIRO
Application Number:
JP2014215117A
Publication Date:
June 11, 2015
Filing Date:
October 22, 2014
Export Citation:
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Assignee:
SUMITOMO CHEMICAL CO LTD
International Classes:
C07D339/08; C07C309/17; G03F7/004; G03F7/038; G03F7/039; H01L21/027
Domestic Patent References:
JP2006008587A2006-01-12
JP2014199389A2014-10-23
JP2014048500A2014-03-17
Attorney, Agent or Firm:
中山 亨
坂元 徹