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Title:
SALT, RESIST COMPOSITION, AND METHOD OF PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2015107957
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a salt which allows a resist pattern to be produced with good line edge roughness (LER).SOLUTION: The salt is represented by formula (I) [where Rand Reach independently represent a hydrogen atom, a hydroxy group, or a C1-C12 hydrocarbon group, provided that -CH- contained in the hydrocarbon group may be substituted with -O- or -CO-; m and n each independently represent 1 or 2; two R's are the same or different from each other when m is 2; two R's are the same or different from each other when n is 2; Arand Areach independently represent an optionally substituted aromatic hydrocarbon group or an optionally substituted heteroaromatic hydrocarbon group; and Aand Aeach independently represent an organic anion].

Inventors:
ADACHI YUKAKO
ICHIKAWA KOJI
YOSHIDA MASASHI
Application Number:
JP2014215118A
Publication Date:
June 11, 2015
Filing Date:
October 22, 2014
Export Citation:
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Assignee:
SUMITOMO CHEMICAL CO LTD
International Classes:
C07D339/06; C07D339/08; C09K3/00; G03F7/004; G03F7/038; G03F7/039; H01L21/027
Domestic Patent References:
JP2003342254A2003-12-03
JP2009084573A2009-04-23
JP2015107956A2015-06-11
Attorney, Agent or Firm:
中山 亨
坂元 徹