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Patent Searching and Data


Title:
SALT, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2019053307
Kind Code:
A
Abstract:
To provide a resist composition capable of producing a resist pattern with a good mask error factor (MEF).SOLUTION: The resist composition contains a salt represented by formula (I) and a resin containing a structural unit represented by a (meth)acrylate derivative having a 1-ethyl or 1-isopropyl adamantyl group. [In the formula (I), Rand Reach represent a hydrogen atom or the like; m and n each independently represent 1 or 2; Ar represents an optionally substituted C6-36 aromatic hydrocarbon group or an optionally substituted C6-36 heteroaromatic hydrocarbon group; and Arepresents an organic anion.]SELECTED DRAWING: None

Inventors:
安立 由香子
市川 幸司
安江 崇裕
Application Number:
JP2018199754A
Publication Date:
April 04, 2019
Filing Date:
October 24, 2018
Export Citation:
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Assignee:
住友化学株式会社
International Classes:
G03F7/004; C07C309/17; C07D339/06; C07D339/08; C08F20/10; G03F7/038; G03F7/039; G03F7/20
Attorney, Agent or Firm:
中山 亨
坂元 徹