Title:
SALT, RESIST COMPOSITION AND PRODUCTION METHOD OF RESIST PATTERN
Document Type and Number:
Japanese Patent JP2016204369
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a salt with which a resist pattern having a good focus margin can be produced.SOLUTION: Salts of an anion represented by at least one formula (Ia) and a cation represented by formula (IC) are provided. In the formulae, Xand Xeach independently represent O or S; Xrepresents a divalent saturated hydrocarbon group having at least one F; * represents a bonding site; Rand Reach independently represent H, a hydroxy group, or a hydrocarbon group, in which -CH- included in the hydrocarbon group may be replaced by -O- or -CO-; m and n each independently represent 1 or 2; and Arand Areach independently represent a substituted/unsubstituted aromatic hydrocarbon group or a substituted/unsubstituted hetero aromatic hydrocarbon group.SELECTED DRAWING: None
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Inventors:
ADACHI YUKAKO
ICHIKAWA KOJI
ICHIKAWA KOJI
Application Number:
JP2016081933A
Publication Date:
December 08, 2016
Filing Date:
April 15, 2016
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07D321/10; C07D339/08; C09K3/00; G03F7/004; G03F7/038; G03F7/039; G03F7/20
Domestic Patent References:
| JP2012097074A | 2012-05-24 | |||
| JP2009084573A | 2009-04-23 | |||
| JP2003342254A | 2003-12-03 | |||
| JP2011201860A | 2011-10-13 |
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation