Title:
SAMPLE PROCESSING DEVICE AND SHIELD
Document Type and Number:
Japanese Patent JP2023006259
Kind Code:
A
Abstract:
To provide a sample processing device capable of reducing sputtered particles adhering to the inner wall of a vacuum chamber.SOLUTION: A sample processing device 100 includes a sample processing device that processes a sample 2 by irradiating an ion beam IB to a sample 2 includes an ion source 20 that irradiates the sample 2 with the ion beam IB, a vacuum chamber in which the sample 2 is accommodated, a shielding member 50 placed on the sample 2 and shielding the ion beam IB, and a shield 60 against which sputtered particles generated by irradiation of the shielding member 50 with the ion beam IB collide, and the ion beam IB passes between the shield 60 and the shielding member 50 and irradiates the sample 2.SELECTED DRAWING: Figure 10
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Inventors:
NEGISHI TSUTOMU
KIMURA TATSUTO
KIMURA TATSUTO
Application Number:
JP2021108772A
Publication Date:
January 18, 2023
Filing Date:
June 30, 2021
Export Citation:
Assignee:
JEOL LTD
International Classes:
H01J37/20; H01J37/305
Attorney, Agent or Firm:
Fuse Yukio
Michie Obuchi
Yoshinobu Yoshida
Michie Obuchi
Yoshinobu Yoshida