Title:
SAMPLE STAGE FOR ALIGNER
Document Type and Number:
Japanese Patent JP3178517
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a sample stage for an aligner, which is capable of accurately aligning a pattern already constituted on a sample substrate to a mask pattern, by dividing the sample stage into a central part and peripheral parts that surround the central part, and by moving at least a part of the peripheral parts along radial direction of the sample stage in a state with the sample being chucked.
SOLUTION: This sample stage is dividing into a sample-stage central part, sample-stage peripheral fixed parts, and sample-stage peripheral movable parts. A silicon substrate 21 is chucked on the sample-stage movable parts by driving vacuum chicks 16 of the sample-stage peripheral movable parts, while the operation of a vacuum chuck driver 24 of the sample-stage central part is stopped to suspend the chucking function of the vacuum chuck 14 of the sample-stage central part. While the silicon substrate 21 is being suction-held in this way only by the sample-stage peripheral movable part vacuum chuck 16, a motor 23 for the movement is made to move individual sample-stage peripheral movable parts radially toward outside along the radial directions.
Inventors:
Naoaki Aisaki
Application Number:
JP5379398A
Publication Date:
June 18, 2001
Filing Date:
March 05, 1998
Export Citation:
Assignee:
NEC
International Classes:
H01L21/683; G03F7/20; G03F9/00; H01L21/027; (IPC1-7): H01L21/027; G03F7/20; G03F9/00; H01L21/68
Domestic Patent References:
| JP1218020A |
Attorney, Agent or Firm:
Yosuke Goto (1 person outside)