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Title:
SAPPHIRE SUBSTRATE MANUFACTURING METHOD AND GROUP III NITRIDE SEMICONDUCTOR LIGHT EMITTING ELEMENT MANUFACTURING METHOD
Document Type and Number:
Japanese Patent JP2016012664
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a sapphire substrate manufacturing method and a group III nitride semiconductor light emitting element manufacturing method, which can form a resist of a favorable shape to form a fine convexoconcave shape with high accuracy.SOLUTION: A sapphire substrate manufacturing method comprises a first resist pattern formation process, a second resist pattern formation process and a sapphire wafer etching process. The second resist pattern formation process includes: a first resist etching process (S210) of etching a resist R1 in a first period T1 by supplying a Clgas to a resist R1; a plasma irradiation process (S220) of irradiating a plasmatized Ar gas on the resist R1 in a second period T2; and a second resist etching process (S230) of etching the resist R1 in a third period T3 by supplying a Clgas to the resist R1 to form a resist R2.

Inventors:
TANIYAMA YOSHINORI
MATSUTANI TETSUYA
Application Number:
JP2014133658A
Publication Date:
January 21, 2016
Filing Date:
June 30, 2014
Export Citation:
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Assignee:
TOYODA GOSEI KK
International Classes:
H01L33/22; H01L33/32
Domestic Patent References:
JP2008060286A2008-03-13
JPH09213687A1997-08-15
JP2014096394A2014-05-22
JP2012204785A2012-10-22
JP2010283095A2010-12-16
JPH04306827A1992-10-29
JP2008177528A2008-07-31
JP2012169366A2012-09-06
JP2012064811A2012-03-29
JP2011134800A2011-07-07
JP2000221698A2000-08-11
Foreign References:
US5332653A1994-07-26
US20090314743A12009-12-24
Other References:
LEE CHIA-EN ET AL.: "Enhancement of Flip-Chip Light-Emitting Diodes With Omni-Directional Reflector and Textured Micropil", IEEE PHOTONICS TECHNOLOGY LETTERS, vol. 19, no. 16, JPN6017025151, 1 July 2007 (2007-07-01), US, pages 1200 - 1202, XP011187388, ISSN: 0003595819, DOI: 10.1109/LPT.2007.901718
Attorney, Agent or Firm:
Osamu Fujitani
Akinori Isshiki