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Patent Searching and Data


Title:
SCANNING TYPE ELECTRON MICROSCOPE
Document Type and Number:
Japanese Patent JPH06267488
Kind Code:
A
Abstract:

PURPOSE: To prevent the point of impact of an electron beam from being fluctuated during measurement by providing an aperture which has a large opening window corresponding to the swinging with of an electron beam between an objective lens and a device to be measured.

CONSTITUTION: An electron beam produced from an electron beam generator is converged by an objective lens 1 and is applied to a device 2 to be measured. An aperture 3 is provided between the objective lens 1 and the device to be measured. The aperture 3 is constituted of a first plate-like aperture 4 and a second plate-like aperture 5 which are arranged close to each other. The aperture 4 and the aperture 5 respectively are relatively displaced in the direction vertical to the direction of the passage of the electron beam. The size of an opening window 6 can be changed by an amount of relative displacement. The size of the opening window 6 can be set to nearly same size as the swinging width of a primary electron beam. Thereby, electromagnetic waves from the region in which electron charges exist is effectively shielded by the aperture 3.


Inventors:
KOMATSU BUNRO
Application Number:
JP5417393A
Publication Date:
September 22, 1994
Filing Date:
March 15, 1993
Export Citation:
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Assignee:
TOSHIBA CORP
International Classes:
H01J37/09; H01J37/28; (IPC1-7): H01J37/28; H01J37/09
Attorney, Agent or Firm:
Kazuo Sato (3 others)