Title:
SCRATCH REDUCING AGENT AND SCRATCH REDUCING METHOD
Document Type and Number:
Japanese Patent JP2017163148
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a scratch reducing agent capable of polishing a polishing object so as to reduce scratches observed on a polished surface thereof, and to provide a scratch reducing method using the same.SOLUTION: A scratch reducing agent is used for reducing scratches observed on a polished surface after polishing a polishing object having a metal or an interlayer insulating film, and contains silica and oxidizer where functional groups of organic acid are immobilized on the surface by chemical bonding. A scratch reducing method reduces scratches observed on the polished surface after polishing the polishing object having a metal or an interlayer insulating film, by using the scratch reducing agent.SELECTED DRAWING: None
Inventors:
YOKOTA SHUGO
KACHI YOSHIHIRO
AKATSUKA TOMOHIKO
KACHI YOSHIHIRO
AKATSUKA TOMOHIKO
Application Number:
JP2017081227A
Publication Date:
September 14, 2017
Filing Date:
April 17, 2017
Export Citation:
Assignee:
FUJIMI INC
International Classes:
H01L21/304; B24B37/00; C09K3/14
Domestic Patent References:
| JP2011020208A | 2011-02-03 | |||
| JP2011165759A | 2011-08-25 |
Foreign References:
| WO2011093153A1 | 2011-08-04 |
Attorney, Agent or Firm:
Makoto Onda
Hironobu Onda
Hironobu Onda