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Patent Searching and Data


Title:
SCRUBBING AND CLEANING MACHINE, AND SCRUBBING AND CLEANING METHOD
Document Type and Number:
Japanese Patent JPH04209530
Kind Code:
A
Abstract:

PURPOSE: To prevent that particles removed from a film on a substrate to be cleaned are attracted to the film again by a method wherein electric charges whose polarities are opposite are applied to the substrate to be cleaned and to a rotary brush part.

CONSTITUTION: A battery 4 is built in a fixation part 1; also a motor 3 which is driven by using the battery is built in the part 1. Electric charges whose polarities are different are applied to a stage 6 on which a substrate 7 to be cleaned has been placed and to a rotary brush part 2. When the substrate 7 is cleaned, the substrate 7 on which a film 7a has been formed is placed on the stage 6. While a cleaning liquid is being supplied form a supply port 5, the stage 2 is turned, and a brush 2a is pressed against the film 7a formed on the substrate 7 so as to clean the substrate. Since the electric charges whose polarities are different are applied to the substrate 7 and to the brush 2a in this case and the substrate is scrubbed and cleaned, particles whose polarity is the same as that of the substrate 7 are attracted to the brush 2a at the part 2 whose polarity is different. Consequently, it is possible to prevent that the particles removed from the film 7a on the surface of the substrate 7 adhere again to the film 7a.


Inventors:
KANEMITSU HIDEYUKI
HIRUUMI JIYUNJI
Application Number:
JP40058990A
Publication Date:
July 30, 1992
Filing Date:
December 06, 1990
Export Citation:
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Assignee:
FUJITSU LTD
International Classes:
B08B1/00; H01L21/304; B08B6/00; (IPC1-7): H01L21/304
Attorney, Agent or Firm:
Sadaichi Igita