Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
SEEDING TREATMENT METHOD TO SUBSTRATE, DIAMOND FINE STRUCTURE, AND METHOD FOR PRODUCING THE SAME
Document Type and Number:
Japanese Patent JP2009120929
Kind Code:
A
Abstract:

To provide a technique capable of producing a fine structure only by diamond film deposition without using an etching process for diamond regarding a seeding treating method to a substrate, a diamond fine structure obtained by subjecting the surface of the obtained diamond-seeded substrate to diamond crystal growth, and a method for producing the same.

Disclosed is a seeding treatment method of diamond particulates to a substrate P1 in which only the specified part of a substrate is subjected to seeding, wherein seeding is performed only to the surface of the substrate which has been subjected to oxygen terminal treatment, and the surface of the substrate which has been subjected to hydrogen terminal treatment is not subjected to seeding, by using nano diamond fine particles. Also disclosed are a diamond fine structure obtained by subjecting the surface of the obtained diamond-seeded substrate to diamond crystal growth, and a method for producing the same.


Inventors:
UETSUKA HIROSHI
NEBEL CHRISTOPH
Application Number:
JP2007299293A
Publication Date:
June 04, 2009
Filing Date:
November 19, 2007
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
NAT INST OF ADV IND & TECHNOL
International Classes:
C23C16/02; C23C16/04; C23C16/27; C23C16/511
Domestic Patent References:
JP2009530227A2009-08-27
JPH0656585A1994-03-01
JP2000090818A2000-03-31
JP2006078375A2006-03-23
JP2005306617A2005-11-04
JP2009530227A2009-08-27
JPH0656585A1994-03-01