Title:
選択可能なデュアルポジション型マグネトロン
Document Type and Number:
Japanese Patent JP4948391
Kind Code:
B2
Abstract:
A continuously variable multi-position magnetron that is rotated about a central axis in back of a sputtering target at a freely selected radius. The position is dynamically controlled from the outside, for example, through a hydraulic actuator connected between a pivoting arm supporting the magnetron and an arm fixed to the shaft, by two coaxial shafts independent controllable from the outside and supporting the magnetron through a frog-leg mechanism, or a cable connected between the pivoting arms and moved by an external slider. The magnetron can be rotated at two, three, or more discrete radii or be moved in a continuous spiral pattern.
Inventors:
Gang, Tsar Ching
Yang, Hong, S.
Sabra Mani, Anansa, K.
Ewart, Maurice, E.
Miller, Keith, A.
Burkhart, Vincent, E.
Yang, Hong, S.
Sabra Mani, Anansa, K.
Ewart, Maurice, E.
Miller, Keith, A.
Burkhart, Vincent, E.
Application Number:
JP2007505006A
Publication Date:
June 06, 2012
Filing Date:
March 15, 2005
Export Citation:
Assignee:
APPLIED MATERIALS,INCORPORATED
International Classes:
C23C14/35; H01J37/34; H01L21/285
Domestic Patent References:
| JP2001240964A | ||||
| JP7226398A |
Foreign References:
| WO2003100819A1 |
Attorney, Agent or Firm:
Koichi Tsujii
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Makoto Hirano
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Makoto Hirano