Title:
誘電体上の酸化物の選択的ＰＥＡＬＤ
Document Type and Number:
Japanese Patent JP7183187
Kind Code:
B2
Abstract:
Methods for selectively depositing oxide thin films on a dielectric surface of a substrate relative to a metal surface are provided. The methods can include at least one plasma enhanced atomic layer deposition (PEALD) cycle including alternately and sequentially contacting the substrate with a first precursor comprising oxygen and a species to be included in the oxide, such as a metal or silicon, and a second plasma reactant. In some embodiments the second plasma reactant comprises a plasma formed in a reactant gas that does not comprise oxygen. In some embodiments the second plasma reactant comprises plasma generated in a gas comprising hydrogen.
Inventors:
Towa Eva
Poa Vilyami Jay.
Hakka Suvi
Toshiya Suzuki
Jia Ling Yun
Kim Soon Ja
Madea Oreste
Poa Vilyami Jay.
Hakka Suvi
Toshiya Suzuki
Jia Ling Yun
Kim Soon Ja
Madea Oreste
Application Number:
JP2019563260A
Publication Date:
December 05, 2022
Filing Date:
May 03, 2018
Export Citation:
Assignee:
ASP Holding B.V.
International Classes:
H01L21/316; C23C16/455; C23C16/50
Domestic Patent References:
| JP2003276111A | ||||
| JP61198732A | ||||
| JP2014135475A | ||||
| JP2010041038A | ||||
| JP2011521452A | ||||
| JP2014063859A | ||||
| JP2014116517A | ||||
| JP2008510075A |
Foreign References:
| US20150380302 | ||||
| US20160322214 | ||||
| WO2016138284A1 |
Attorney, Agent or Firm:
Takashi Onodera
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