To obtain the subject composition having volume resistivity of semiconducting region in which the change due to moisture is small, scarcely exhibiting corrosive property to metal and useful as a static charge member, etc., for electrophotographic type image forming apparatus by including a polyalkylene oxide and a specific alkali metal salt, etc., at a specific ratio.
This thermoplastic resin composition normally comprises (A) 2-99.9 wt.% polyalkylene oxide (e.g. polyethylene oxide) having 1,000-10,000,000 weight-average molecular weight, (B) 0-97.9 wt.% other thermoplastic resin, preferably vinylidene fluoride-based resin (e.g. polyvinylidene fluoride) and (C) 0.1-5 wt.% alkali metal salt having ≤1 g/L solubility to water at 23°C, preferably cesium perfluoroalkylsulfonate (e.g. cesium perfluorooctanesulfonate). The composition is useful for antistatic films for packaging electronic parts and dust absorption preventing members for various OA equipment, etc.
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MATSUNAGA SATORU
TERAMOTO KAKICHI
AKATSU MASAMI
TERAJIMA HISAAKI
