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Title:
SEMICONDUCTIVE RESIN COMPOSITION
Document Type and Number:
Japanese Patent JP3766153
Kind Code:
B2
Abstract:

PROBLEM TO BE SOLVED: To obtain a semiconductive resin composition reduced in a dispersion of volume resistivity and undergoing very little change in volume resistivity upon the repeated application of a high voltage by mixing a fluororesin having a specified relative permittivity with an alkali metal sulfonate or alkali metal carboxylate of a perfluroalkyl compound and an inorganic alkali metal salt in a specified ratio.
SOLUTION: This composition comprises 100 pts.wt. fluororesin having a relative permittivity of 3 or above (at 1kHz and 23°C), 0.01-5 ptw.wt. alkali metal sulfonate or alkali metal carboxylate of a perfluoroalkyl compound and 0.01-1 pt.wt. inorganic alkali metal salt. The fluororesin is desirably a vinylidene fluoride resin. The composition is desirably one in which the alkali metal sulfonate or carboxylate of the perfluoroalkyl compound is potassium sulfonate of a perfluoroalkyl compound and is used in an amount of 0.03-1 pt.wt. per 100 pts.wt. fluororesin.


Inventors:
Hideki Kitamura
Kakitsu Teramoto
Satoru Matsunaga
Masami Akatsu
Application Number:
JP33503896A
Publication Date:
April 12, 2006
Filing Date:
November 29, 1996
Export Citation:
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Assignee:
Kureha Co., Ltd.
International Classes:
C08K3/16; C08L27/12; C08K5/098; C08K5/42; C08L27/16; H01B1/22; H01B3/30; (IPC1-7): C08L27/12; C08K3/16; C08K5/098; C08K5/42; C08L27/16; H01B1/22; H01B3/30
Domestic Patent References:
JP6263949A
JP2189354A
JP61162545A
JP54014457A
Attorney, Agent or Firm:
Shigeaki Nishikawa