Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
SEMICONDUCTOR CLEANING EQUIPMENT
Document Type and Number:
Japanese Patent JPH0817891
Kind Code:
A
Abstract:

PURPOSE: To make the effective use of an area of a high degree of purity like a clean room by a method wherein an object to be processed can independently be processed by each individual function in a unit of process such as alien substance removal, metal separation organic substance separation, dryness or the like and a necessary cleaning process is performed by combination of optical process units.

CONSTITUTION: An object to be processed can independently be processed by each individual function in a unit such as foreign substance removal process, metal separation process, organic substance separation process, ion kind removal process, oxide film separation process or drying process, and a necessary cleaning process is performed by combination of optical process units. For example, an object to be processed received by a unitinside carry handling mechanism built-in feeder 17 is supplied from a feeder 18 to another process equipment 10 via respective process units 11, 15, 16 directly coupled to each other in order of alien substance removal →natural oxide film separation → dryness. After the process in the another process equipment 10 is completed. the process is completed in order of foreign substance removal → organic substance separation → dryness, and the object is transferred to the next process equipment by the feeder 17.


Inventors:
IWASAKI TAKEMASA
Application Number:
JP14432494A
Publication Date:
January 19, 1996
Filing Date:
June 27, 1994
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
HITACHI LTD
International Classes:
H01L21/677; H01L21/027; H01L21/304; H01L21/306; H01L21/68; (IPC1-7): H01L21/68; H01L21/027; H01L21/304; H01L21/306
Attorney, Agent or Firm:
Ogawa Katsuo