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Patent Searching and Data


Title:
SEMICONDUCTOR DEVICE, MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE, AND THIN FILM
Document Type and Number:
Japanese Patent JP2013098401
Kind Code:
A
Abstract:

To provide a semiconductor device including a new cyclosiloxane polymer indicating conductivity or semiconductivity.

A semiconductor device comprises a charge transport layer composed of a plasma polymer including a structural unit (A) having a transition metal as a central metal and a structural unit (B) located between adjacent structural units (A) and including a cyclosiloxane skeleton. The charge transport layer is formed by plasma-polymerizing an organic metallic compound having a transition metal as a central metal and a cyclosiloxane compound in a reactor.


Inventors:
KAWAHARA JUN
HAYASHI YOSHIHIRO
Application Number:
JP2011240858A
Publication Date:
May 20, 2013
Filing Date:
November 02, 2011
Export Citation:
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Assignee:
RENESAS ELECTRONICS CORP
International Classes:
H01L29/786; C08G79/14; H01L21/336; H01L21/365; H01L51/05; H01L51/30; H01L51/40
Attorney, Agent or Firm:
Shinji Hayami
Satoshi Amagi