Title:
SEMICONDUCTOR DEVICE AND PROCESS FOR PRODUCTION OF SAME
Document Type and Number:
Japanese Patent JPS5244187
Kind Code:
A
Abstract:
PURPOSE:To remove channel stoppers by using a substrate having undulation on its surface, and make a bipolar IC of high speed and high scale of integration by shorting the space between buried layers.
Inventors:
KACHI TADAO
ITOU KATSUHIKO
HAYASAKA AKIO
ITOU KATSUHIKO
HAYASAKA AKIO
Application Number:
JP11975275A
Publication Date:
April 06, 1977
Filing Date:
October 06, 1975
Export Citation:
Assignee:
HITACHI LTD
International Classes:
H01L27/00; H01L21/02; H01L21/76; H01L21/762; H01L27/12; (IPC1-7): H01L21/76