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Patent Searching and Data


Title:
SEMICONDUCTOR DEVICE
Document Type and Number:
Japanese Patent JP60070761
Kind Code:
A
Abstract:

PURPOSE: To obtain stability for a prolonged term regarding reverse leakage current characteristics by forming an annular aluminum film to the predetermined surface of a Pb group gas film while being separated from a P-N junction and surrounding the P-N junction.

CONSTITUTION: An anode contact window is bored, Al is evaporated, and an annular aluminum film 12 is formed together with an anode electrode 5 through selective etching by a photographic process. The whole is sintered in a nitrogen atmosphere in order to obtain an ohmic contact between the anode electrode 5 and a P+ diffusion layer 2. Glass 3b under the Al film 12 during a sintering process has some quantity of positive charges ⊕ though glass 3a in a section in which there is no Al film 12 has a large quantity of negative currents . Consequently, an inversion layer 9 is stopped only under the glass film 3a. Accordingly, an initial contact with a channel stopper layer 4 of the inversion layer 9 is prevented, and leakage currents are controlled.


Inventors:
Tsunoishi, Chiharu
Application Number:
JP1983000178426
Publication Date:
April 22, 1985
Filing Date:
September 27, 1983
Export Citation:
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Assignee:
SHINDENGEN ELECTRIC MFG CO LTD
International Classes:
H01L21/316; H01L29/06; H01L29/40; (IPC1-7): H01L21/314; H01L29/40