Title:
SEMICONDUCTOR DEVICE
Document Type and Number:
Japanese Patent JPH09172174
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a protective device with respect to static discharge, by causing the width of a current path to be greater than the length of the current path by several times or more, extending a contact portion in parallel to the current path, and separating the contact portion from the current path at a distance equal to or greater than twice the length of the current path. SOLUTION: This protection circuit is characterized by setting of the channel width of a transistor 13 and the distance A extending from an end portion 25 of the channel to a metal-silicon contact portion 26 coupling a drain 12 with a metal conductor 11. A preferred example of numerical value representing the ratio of the channel length to the channel width W is preferably about 25 or greater. By this setting, conduction of a large instantaneous current spike is enabled under a minute forward voltage. A preferred example of numerical value representing the ratio of the distance A to the channel length is about two or greater. By this setting of the distance A, the protection level with respect to static discharge may by improved at least twice or three times. Thus, an input/output protective device for MOS device which may endure static discharge of 3000V or more may be provided.
More Like This:
Inventors:
ROBAATO ENU RAUNTORII
TOROI EICHI HAANDON
TOROI EICHI HAANDON
Application Number:
JP24820396A
Publication Date:
June 30, 1997
Filing Date:
September 19, 1996
Export Citation:
Assignee:
TEXAS INSTRUMENTS INC
International Classes:
H02H7/20; G05F3/24; H01L21/822; H01L21/8234; H01L27/02; H01L27/04; H01L27/06; H01L27/088; H01L29/10; H01L29/423; H01L29/78; H03H1/00; (IPC1-7): H01L29/78; H01L21/822; H01L21/8234; H01L27/04; H01L27/088
Domestic Patent References:
JPS6144471A | 1986-03-04 |
Attorney, Agent or Firm:
Akira Asamura (2 outside)
Previous Patent: FABRICATION OF SEMICONDUCTOR DEVICE
Next Patent: TERMINATION STRUCTURE OF SEMICONDUCTOR DEVICE AND ITS MANUFACTURE
Next Patent: TERMINATION STRUCTURE OF SEMICONDUCTOR DEVICE AND ITS MANUFACTURE