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Title:
SEMICONDUCTOR DEVICE
Document Type and Number:
Japanese Patent JPS6384121
Kind Code:
A
Abstract:

PURPOSE: To sufficiently enhance reverse breakdown strength thereby to increase the area of electrodes on a pellet and to improve the performance of an element by forming a barrier wall for an insulating layer for protecting the surface of a junction of an insulator of an Si compound, such as an SiO2.

CONSTITUTION: A P-type layer 12 and an N- type layer 13 are superposed on an Mo electrode 11, an N+ type layer 14 is formed partly on the surface of the layer 13, and an aluminum electrode 15 is attached. A barrier wall 16 of SiO2 film is formed on the periphery of the electrode 15. A covering layer 17 on the exposed P-N junction surface beveled by the wall 16 is prevented from flowing to the electrode 15. A depleted layer is extended to the position of a broken line (b) by the insulating wall 16, the allowable breakdown strength is increased, the wall 16 performs a role of protecting the surface of an element, thereby remarkably improving the performance of the element.


Inventors:
KANETANI MASATOSHI
HOKODATE KIMINOBU
IGARASHI YUKIO
NAKAZAWA SHIGEO
Application Number:
JP23061686A
Publication Date:
April 14, 1988
Filing Date:
September 29, 1986
Export Citation:
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Assignee:
TOSHIBA CORP
International Classes:
H01L21/31; (IPC1-7): H01L21/31
Attorney, Agent or Firm:
Takehiko Suzue



 
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