To provide a semiconductor laser device having a small astigmatic difference, low noise and the stabilized lateral mode from the low output to the high output.
On an N-type GaAs semiconductor board 1, an N-type GaAs buffer layer 2, an N-type Ga0.45Al0.55As first clad layer 3, a Ga0.85Al0.15As active layer 4, a P-type Ga0.45Al0.55As first light guiding layer 5, and a P-type Ga0.8Al0.2 As second light guiding layer 6 are formed. On the second light guiding layer 6, a P-type Ga0.45Al0.55As stripe region 7a is formed, and an N-type Ga0.3Al0.7As current blocking layer 7 is formed on both sides of the stripe region 7a. A P-type Ga0.45Al0.55As second clad layer 8 is formed on the stripe region 7a and the current blocking layer 7, and a P-type GaAs contact layer 9 is formed on the second clad layer 8.
WO/2010/092758 | THIN FILM FORMING APPARATUS AND THIN FILM FORMING METHOD |
JPH09283449 | PLASMA CHEMICAL VAPOR DEPOSITION SYSTEM |
JP2002009140 | ELECTROSTATIC CHUCK APPARATUS |
KONDO OSAMU
KUME MASAHIRO
YOSHIKAWA AKIO
NAITO HIROKI