Title:
半導体レーザ素子の製造方法及びその半導体レーザ装置並びにガス分析装置
Document Type and Number:
Japanese Patent JP7121536
Kind Code:
B2
Abstract:
In order to form a reflection film on a rear end facet of a waveguide more easily than conventional, by etching a laminated structure formed on a substrate 2, a plurality of waveguides 3L segmented in a lattice shape are formed, and a reflection film 4 is formed on a surface of each of the waveguides 3L for reflecting light in each of the waveguides 3L.
Inventors:
Makoto Matsuhama
Application Number:
JP2018096588A
Publication Date:
August 18, 2022
Filing Date:
May 18, 2018
Export Citation:
Assignee:
HORIBA, Ltd.
International Classes:
H01S5/028; G01N21/3504; H01S5/026; H01S5/12
Domestic Patent References:
| JP10173282A | ||||
| JP2012002799A | ||||
| JP59076490A | ||||
| JP8293642A |
Attorney, Agent or Firm:
Nishimura Ryuhei
Shindai Saito
Yoshinaga Uemura
Shindai Saito
Yoshinaga Uemura
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