PURPOSE: To discriminate a symbol transferred onto a semiconductor and to facilitate the discrimination of a use pattern on a manufacturing mask by adding the symbol being different in each pattern to the respective patterns of the manufacturing mask.

CONSTITUTION: As for a semiconductor manufacturing mask 11, plural pieces of the same or different patterns 12 corresponding to one semiconductor are formed on one piece of base material. To each pattern 12, the respective different symbols 13W16 are added, and in a wafer working process, to its each separate chip, the symbol is transferred, and even after the wafer is worked to each semiconductor, the symbol 14 which can be discriminated optically is left on a semiconductor chip 17. Accordingly, from which pattern on the mask the chip is manufactured is decided easily.