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Title:
SEMICONDUCTOR PROCESSOR
Document Type and Number:
Japanese Patent JPH05121360
Kind Code:
A
Abstract:

PURPOSE: To improve the productivity by reducing the cleaning frequency as compared with conventional, shortening the cleaning time, and improving the device working ratio.

CONSTITUTION: At the bottom of a chamber 1, a lower ring member 11 is provided in cylindrical shape to surround bellows mechanism 4. Moreover, an upper ring member 12 is provided to extend from the periphery of a lower electrode 3 and surround the lower ring member 11. These lower ring member 11 and the upper ring member 12 are made of insulating material, and are detachable. Moreover, at the bottom of the chamber 1 between the below mechanism 4 and the lower ring member 11, a gas purge pipe 13 is connected so that inert gas can be purged.


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Inventors:
FUKAZAWA KAZUO
OKAYAMA NOBUYUKI
SUETSUGU MASACHIKA
Application Number:
JP9040391A
Publication Date:
May 18, 1993
Filing Date:
April 22, 1991
Export Citation:
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Assignee:
TEL YAMANISHI KK
International Classes:
H01L21/302; H01L21/3065; (IPC1-7): H01L21/302
Attorney, Agent or Firm:
Saichi Suyama (1 person outside)



 
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