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Patent Searching and Data


Title:
SEMICONDUCTOR PRODUCTION PLANT
Document Type and Number:
Japanese Patent JP3848796
Kind Code:
B2
Abstract:

PROBLEM TO BE SOLVED: To surely prevent generation of water leakage by providing a clean room with cores 20, 20 having a gable roof projecting thereinside and being made higher than the roof, arranging a drainage passage and a roof drain inside of the core, connecting them to a vertical guter arranged on the outside, and guiding rainwater to the outside.
SOLUTION: On both sides of a clean room 30, cores 20, 20 higher than a gable roof 31 having inclinations on both the sides at almost the midway thereof and being extending in recessed parts 21, 21 provided with drainage channels 22, 22 and roof drain parts and communicated with a vertical gutter on the outside of the core 20 as well as lateral gutters 24, 24 inside of the cores 20, 20. Rainwater drops along the roof 31 into the channels 22, 22. It is collected at each the roof drain, then made to flow in the vertical gutter and discharged outside. Accordingly, through elimination of place at the boundary between the large roof part and the core parts to store the rainwater, an important production area can be protected from leakage water.


Inventors:
Jiro Kakizaki
Hidefumi Suzuki
Toyozo Kaneko
Hiromitsu Shiga
Application Number:
JP10818699A
Publication Date:
November 22, 2006
Filing Date:
April 15, 1999
Export Citation:
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Assignee:
TAKENAKA CORPORATION
International Classes:
E04D13/04; E04H5/02; (IPC1-7): E04H5/02; E04D13/04
Attorney, Agent or Firm:
Furuya Fumio
Eisuke Suzuki