Title:
SEMICONDUCTOR PRODUCTION SYSTEM
Document Type and Number:
Japanese Patent JPH088318
Kind Code:
A
Abstract:
PURPOSE: To obtain a semiconductor production system in which the configuration of a production, line and the modification of layout can be realized easily in a short period at low cost.
CONSTITUTION: The semiconductor production system comprises a transfer room 2, a processing room 4, and a conduction path means 3 normalized by the effective handling diameter Dm of a wafer. Assuming the number of coupling openings of the conduction path means 3 which can be coupled with a transfer room 2 of room number (m) is nm, the distance b. between the center of plan view in the transfer room 2 and a coupling opening is set as follows: (Dm/2)< bm≤{(Dm/2)/tan(180°/nm)} and the maximum dimension of the coupling opening is set substantially equal to Dm.
Inventors:
KAWAMURA YOSHIO
KOBAYASHI HIDE
MORIYAMA SHIGEO
KOBAYASHI HIDE
MORIYAMA SHIGEO
Application Number:
JP13401294A
Publication Date:
January 12, 1996
Filing Date:
June 16, 1994
Export Citation:
Assignee:
HITACHI LTD
International Classes:
B23Q7/16; B24B51/00; H01L21/02; H01L21/677; H01L21/68; (IPC1-7): H01L21/68; B23Q7/16; B24B51/00; H01L21/02
Attorney, Agent or Firm:
Junnosuke Nakamura