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Patent Searching and Data


Title:
SEMICONDUCTOR THIN FILM, MANUFACTURE THEREOF, AND MAGNETOELECTRIC TRANSDUCER
Document Type and Number:
Japanese Patent JP09153460
Kind Code:
A
Abstract:

To provide a semiconductor thin film which is applicable keeping high enough in reliability in a wide range of temperature and uniform in electrical properties, a manufacturing method thereof, and a magnetoelectric transducer by a method wherein an InSb thin film equal in carrier mobility to a single crystal is easily and uniformly formed directly on a substrate at a low cost.

First, a surface layer is removed from an Si crystal substrate 1, and the Si crystal substrate 1 where the surface layer is removed is dipped into a water solution which contains hydrogen fluoride and ammonium fluoride. Then, a ground layer 3 of element selected out of Al, Ga, and In is formed on the substrate 1, and a pre-deposit layer 4 which contains at least In and Sb is formed on the ground layer 3. A semiconductor thin film 5 which contains at least In and Sb is formed on the pre-deposit layer 4 at a temperature higher than a temperature at which the pre-deposit layer 4 is started to be formed.


Inventors:
Kawasaki, Tetsuo
Korechika, Akihiro
Hattori, Takamichi
Tanigawa, Hideyuki
Kitahata, Makoto
Application Number:
JP1995000314153
Publication Date:
June 10, 1997
Filing Date:
December 01, 1995
Export Citation:
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Assignee:
MATSUSHITA ELECTRIC IND CO LTD
International Classes:
G01R33/07; C23G1/02; G01R33/09; H01L21/203; H01L21/306; H01L43/08; H01L43/12; C23G1/02; G01R33/06; H01L21/02; H01L43/00; H01L43/08; (IPC1-7): H01L21/203; C23G1/02; G01R33/07; G01R33/09; H01L21/306; H01L43/08