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Title:
Semiconductor wafer junction incorporating an electric interconnecting part and an optical interconnecting part
Document Type and Number:
Japanese Patent JP6177766
Kind Code:
B2
Abstract:
Methods for bonding semiconductor wafers requiring the transfer of electrical and optical signals between the bonded wafers and across the bonding interface by interfusing optical interconnects on one wafer with optical interconnects on a second wafer, interfusing electrical interconnects on one wafer with electrical interconnects on the second wafer, and interfusing a dielectric intermediary bonding layer on one wafer with the dielectric intermediary bonding layer on the second wafer to bond the wafers together with electrical interconnections and optical interconnections between the wafers. The methods are also applicable to the bonding of semiconductor wafers to provide a high density of electrical interconnects between wafers.

Inventors:
Elle-Go Lowry, Hussein S
Chuang, chi-ri
Yadavari, Kameshwar
Fan, queen
Application Number:
JP2014510381A
Publication Date:
August 09, 2017
Filing Date:
May 04, 2012
Export Citation:
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Assignee:
Ostend Technologies Incorporated
International Classes:
H01L21/02; G02B6/12; H01L27/12; H01S5/026
Domestic Patent References:
JP2007515779A
JP201062351A
JP2006517344A
JP2005203596A
Foreign References:
WO2001006546A2
US20050053319
Attorney, Agent or Firm:
Masaki Yamakawa
Shigeki Yamakawa