Title:
SEPARATION OF C2F6 FROM CF4 BY ADSORPTION ON ACTIVATED CARBON
Document Type and Number:
Japanese Patent JP2004307507
Kind Code:
A
Abstract:
To obtain an adsorbing agent enabling a long onstream time in a given column size, and having high selectivity to fluorocarbon impurities except CF4 product.
This invention relates to an improvement in a process for removing C2F6 as an impurity from a CF4 containing gas, preferably CF4 produced by the reaction of F2 with carbon. The improvement in the process comprises the steps: contacting the CF4 containing gas with an activated carbon having a CCl4 activity of 43-55, in an adsorption bed to effect adsorption of the C2F6 impurity; and, recovering purified CF4 product in the effluent from the adsorbent bed.
Inventors:
PHILLIP BRUCE HENDERSON
GOLDEN TIMOTHY CHRISTOPHER
GOLDEN TIMOTHY CHRISTOPHER
Application Number:
JP2004113197A
Publication Date:
November 04, 2004
Filing Date:
April 07, 2004
Export Citation:
Assignee:
AIR PROD & CHEM
International Classes:
B01D53/02; B01D53/04; B01J20/20; C07C17/389; C07C19/08; (IPC1-7): C07C17/389; B01D53/02; B01J20/20; C07C19/08
Attorney, Agent or Firm:
Atsushi Aoki
Takashi Ishida
Tetsuji Koga
Nagasaka Tomoyasu
Masaya Nishiyama
Takashi Ishida
Tetsuji Koga
Nagasaka Tomoyasu
Masaya Nishiyama
Previous Patent: JP2004307506
Next Patent: STABLE COSMETIC COMPOSITION COMPRISING FATTY ACID GLYCERIDE, ALCOHOL AND SPECISIC SILICONE EMULSIFIE...
Next Patent: STABLE COSMETIC COMPOSITION COMPRISING FATTY ACID GLYCERIDE, ALCOHOL AND SPECISIC SILICONE EMULSIFIE...