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Title:
SHADOW MASK
Document Type and Number:
Japanese Patent JPH0224938
Kind Code:
A
Abstract:

PURPOSE: To enhance the convergence of an electron beam and brightness of image by forming a superconductive film on the substrate of a shadow mask.

CONSTITUTION: A superconductive film 4 consisting of oxide type superconductor, etc., on the substrate 2 of a shadow mask. When an electron beam reaches the shadow mask 1, the magnetic field of electron beam 6 shrinks toward the center of an electron beam aperture 3 by Meissner effect of film 4 and is induced into the aperture 3. This enhances the convergence of the beam 6 to enable light emission in high grightness from a fluorescent plate 5. Therein the shadow mask will not run temperature, the doming phenomenon is prevented, and no chromatic misconvergenge is generated.


Inventors:
OHASHI TOSHIYUKI
Application Number:
JP17579288A
Publication Date:
January 26, 1990
Filing Date:
July 14, 1988
Export Citation:
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Assignee:
YAMAHA CORP
International Classes:
H01J29/07; (IPC1-7): H01J29/07
Attorney, Agent or Firm:
Masatake Shiga (2 outside)



 
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